Optical properties of thin a-C films on Si(100) deposited via a compact planar magnetron plasma device

Authors

  • Matthew Bryan P. Villanueva National Institute of Physics, University of the Philippines Diliman
  • Janella Mae R. Salamania National Institute of Physics, University of the Philippines Diliman
  • Erin Joy C. Tinacba National Institute of Physics, University of the Philippines Diliman
  • Michelle Marie S. Villamayor National Institute of Physics, University of the Philippines Diliman
  • Armando S. Somintac National Institute of Physics, University of the Philippines Diliman
  • Henry J. Ramos National Institute of Physics, University of the Philippines Diliman

Abstract

Amorphous carbon thin films were deposited on silicon(100) substrates using a compact planar magnetron (CPM) plasma device. Graphite was sputtered at varying flowrates of argon, target bias and deposition time. During plasma-enhanced deposition, optical emission spectra (OES) were obtained every 15 minutes. Resulting films were then characterized with Raman spectroscopy and Reflectivity measurements, and conductivity was checked by multimeter probing at 100°C. OES results suggested that non-ionic carbon is being sputtered out during the deposition process. Raman spectra confirm the presence of a-C and trace amounts of a-SiC. Film thickness were determined from reflectivity spectra. All samples were conducting, supporting the graphitic nature of the films.

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Issue

Article ID

SPP2013-PB-18

Section

Poster Session PB

Published

2013-10-23

How to Cite

[1]
MBP Villanueva, JMR Salamania, EJC Tinacba, MMS Villamayor, AS Somintac, and HJ Ramos, Optical properties of thin a-C films on Si(100) deposited via a compact planar magnetron plasma device, Proceedings of the Samahang Pisika ng Pilipinas 31, SPP2013-PB-18 (2013). URL: https://proceedings.spp-online.org/article/view/SPP2013-PB-18.