Nonreactive sputtering deposition of Ti₃SiC₂ thin film on polycarbonate substrate using a magnetized sheet plasma source

Authors

Arjay Sura Department of Physical Sciences, Polytechnic University of the Philippines
Hamdi Muhyuddin Barra National Institute of Physics, University of the Philippines Diliman
Rommel Paulo Viloan National Institute of Physics, University of the Philippines Diliman
Michelle Marie Villamayor National Institute of Physics, University of the Philippines Diliman
Henry J. Ramos National Institute of Physics, University of the Philippines Diliman

Abstract

Synthesis of Ti₃SiC₂ thin film via nonreactive sputtering deposition using graphite as a carbon source was done using a magnetized sheet plasma source. Titanium, silicon and graphite were negatively biased at -50, -200 and -350 V and sputtered by argon plasma at a discharge current of 4A and potential of 50V. The deposition time was kept constant at 120 min while the target bias was varied. XRD results showed that only the sample biased at -350 V target potential exhibited Ti₃SiC₂(105) and Ti₃SiC₂(1013) MAX phase crystalline structure. Other peaks based on XRD correspond to TiC(111) and Ti₅Si₃ facets were also observed.

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Issue

2013: Proceedings of the 31st Samahang Pisika ng Pilipinas Physics Congress

Article ID

SPP2013-PA-33

Section

Poster Session PA

Published

2013-10-23

How to Cite

[1]

A Sura, HM Barra, RP Viloan, MM Villamayor, and HJ Ramos, Nonreactive sputtering deposition of Ti3SiC2 thin film on polycarbonate substrate using a magnetized sheet plasma source, Proceedings of the Samahang Pisika ng Pilipinas 31, SPP2013-PA-33 (2013). URL: https://proceedings.spp-online.org/article/view/SPP2013-PA-33.