Structural and morphological characterization of femtosecond pulsed laser deposited Er:YAG on silicon substrate

Authors

  • Floyd Willis I. Patricio National Institute of Physics, University of the Philippines Diliman
  • Mary Ann C. Calleja National Institute of Physics, University of the Philippines Diliman
  • Arriane P. Lacaba National Institute of Physics, University of the Philippines Diliman
  • Wilson O. Garcia National Institute of Physics, University of the Philippines Diliman

Abstract

We report initial studies in the characterization of the deposited Er:YAG on Silicon(100) substrate by Pulsed Laser Deposition using a femtosecond Ti:Sapphire laser. The parameter investigated was deposition time varied from 2 hours, 3 hours and 4 hours. XRD spectra of the 3-hour and 4-hour deposited films revealed thin film growth on the substrate but the 3-hour deposited film showed better crystalline structure with the YAG (444) as the highly prominent peak. Conversely, no significant peaks were observed in the 2-hour deposited sample. AFM topographical images of the films showed that further increase of deposition time results to larger particles. The 3-hour and 4hour deposited films revealed nanostructures with sizes ranging up to 200 nm and 600 nm respectively.

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Article ID

SPP2013-4A-6

Section

Materials Science

Published

2013-10-23

How to Cite

[1]
FWI Patricio, MAC Calleja, AP Lacaba, and WO Garcia, Structural and morphological characterization of femtosecond pulsed laser deposited Er:YAG on silicon substrate, Proceedings of the Samahang Pisika ng Pilipinas 31, SPP2013-4A-6 (2013). URL: https://proceedings.spp-online.org/article/view/SPP2013-4A-6.