Comparison of single focus and dual foci scanning in single-photon photopolymerization
The photopolymerization of a single focus, and a dual focal scanner setup were simulated in order to compare their performance in a photolithography line scan. The baseline behavior of a stationary focus was first observed and analyzed. From this, the size growth behavior for the two systems were compared. It was observed that the single focus line scan is able to produce smoother line scans in exchange for less size control. Meanwhile, the dual focus setup is able to have more control at the cost of fringed surfaces.