Comparison of sensitivity between reflectivity and angular Goos-Hänchen shift measurements in determining the thickness of CuO film on Cu substrate
We compare the sensitivity of measuring the reflectivity and angular Goos-Hänchen ΘGH shift to determine CuO film thickness on a Cu substrate. Calculation of the response of the detectors used in reflectivity and beamshift measurements showed the capability of both techniques in measuring film thickness less than 8 nm. Our results showed that the response of a photodiode in reflectivity measurements is three orders of magnitude more sensitive than using a quadrant detector (QD) for beamshift measurements.
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