Growth mechanism of zinc oxide films by infrared pulsed laser deposition

Authors

  • Melvin John F. Empizo National Institute of Physics, University of the Philippines Diliman
  • Jeffrey C. de Vero National Institute of Physics, University of the Philippines Diliman
  • Wilson O. Garcia National Institute of Physics, University of the Philippines Diliman
  • Roland V. Sarmago National Institute of Physics, University of the Philippines Diliman

Abstract

The growth mechanism involved in the preparation of zinc oxide (ZnO) films by infrared pulsed laser deposition (IR PLD) was reported for the first time. ZnO films were prepared on glass substrates by IR PLD in vacuum without substrate heating. With the proposed growth mode, the film crystallinity and surface morphology depend on the deposition paramaters like deposition time and laser energy fluence.

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Issue

Article ID

SPP-2010-PA-24

Section

Poster Session PA

Published

2010-10-25

How to Cite

[1]
MJF Empizo, JC de Vero, WO Garcia, and RV Sarmago, Growth mechanism of zinc oxide films by infrared pulsed laser deposition, Proceedings of the Samahang Pisika ng Pilipinas 28, SPP-2010-PA-24 (2010). URL: https://proceedings.spp-online.org/article/view/SPP-2010-PA-24.