Femtosecond pulsed laser deposition of Nd:YAG laser crystal films

Authors

  • Lean Dasallas National Institute of Physics, University of the Philippines Diliman
  • Arriane Lacaba National Institute of Physics, University of the Philippines Diliman
  • Adonis Gallentes National Institute of Physics, University of the Philippines Diliman
  • Gil Nonato Santos Physics Department, De La Salle University
  • Jeffrey de Vero National Institute of Physics, University of the Philippines Diliman
  • Wilson Garcia National Institute of Physics, University of the Philippines Diliman

Abstract

Pulsed Laser Deposition of Neodymium doped Yttrium Aluminum Garnet (Nd:Y3Al5O12) laser crystal films on Si (100) substrate has been performed. A mode-locked femtosecond laser operating at = 785 nm with 100 fs pulse duration and 80 MHz repetition rate was used to ablate the Nd:YAG crystal to provide the deposition flux. The SEM micrographs reveals rectangular grains on film surface. XRD measurement shows preferential growth of (321) Nd: YAG crystals using 500 mW laser power at 10−6 mbar deposition pressure for 2hrs.

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Published

2011-10-24

How to Cite

[1]
L Dasallas, A Lacaba, A Gallentes, GN Santos, J de Vero, and W Garcia, Femtosecond pulsed laser deposition of Nd:YAG laser crystal films, Proceedings of the Samahang Pisika ng Pilipinas 29, SPP2011-PB-27 (2011). URL: https://proceedings.spp-online.org/article/view/SPP2011-PB-27.