Fabrication of low reflectance porous silicon with gradient

Authors

J.M. Oxciano Department of Physical Science, Polytechnic University of the Philippines Sta. Mesa
V.E. Malapit Department of Physical Science, Polytechnic University of the Philippines Sta. Mesa
R. Ampoloquio Department of Physical Science, Polytechnic University of the Philippines Sta. Mesa
A.I. Mabilangan National Institute of Physics, University of the Philippines Diliman
N.G.E. Saplagio National Institute of Physics, University of the Philippines Diliman
Rogelio Dizon Department of Physical Science, Polytechnic University of the Philippines Sta. Mesa
Arnel Salvador National Institute of Physics, University of the Philippines Diliman
Armando Somintac National Institute of Physics, University of the Philippines Diliman

Abstract

Low reflectance porous silicon layers were fabricated using electrochemical etching in an ethanol-hydrofluoric acid solution at different time intervals and different anodic current densities. Layers with varying refractive indices were produced as the current density is changed during the etching process. The samples were characterized via Scanning Electron Microscope (SEM) and Optical Reflectivity. Minimum reflectivity of each sample was obtained from their corresponding reflectance spectra.

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Issue

2011: Proceedings of the 29th Samahang Pisika ng Pilipinas National Physics Congress

Article ID

SPP2011-PB-26

Section

Poster Session PB

Published

2011-10-24

How to Cite

[1]

J Oxciano, V Malapit, R Ampoloquio, A Mabilangan, N Saplagio, R Dizon, A Salvador, and A Somintac, Fabrication of low reflectance porous silicon with gradient, Proceedings of the Samahang Pisika ng Pilipinas 29, SPP2011-PB-26 (2011). URL: https://proceedings.spp-online.org/article/view/SPP2011-PB-26.