Ion currents of Cu-ion beams in a plasma sputter type negative ion source and its correlation with sputtering and negative ion formation

Authors

  • Christian Lorenz Mahinay National Institute of Physics, University of the Philippines Diliman
  • Giovanni Malapit Department of Physical Sciences, College of Science, University of the Philippines, Baguio City
  • April Ulano National Institute of Physics, University of the Philippines Diliman
  • Matthew Poral National Institute of Physics, University of the Philippines Diliman
  • Venice MascariƱas National Institute of Physics, University of the Philippines Diliman
  • Henry Ramos National Institute of Physics, University of the Philippines Diliman

Abstract

Cu- ion beams are produced in a Plasma Sputter Type Negative Ion Source. An Electrostatic Energy Analyzer (ESA) is used to sample the negative ion beams with energies that do not exceed 1keV. The corresponding ion currents of the beams are then calculated. Theoretical values of the sputtering yield and negative ion production probability are calculated per ion energy value and then compared to the ion current. A correlation value of 0.80021 between the experimental data and theoretical values suggests a high correlation; therefore, the ion beam is the product of the processes of sputtering and negative ion formation.

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Article ID

SPP2011-5B-1

Section

Plasma Physics and Nanotechnology

Published

2011-10-24

How to Cite

[1]
CL Mahinay, G Malapit, A Ulano, M Poral, V MascariƱas, and H Ramos, Ion currents of Cu-ion beams in a plasma sputter type negative ion source and its correlation with sputtering and negative ion formation, Proceedings of the Samahang Pisika ng Pilipinas 29, SPP2011-5B-1 (2011). URL: https://proceedings.spp-online.org/article/view/SPP2011-5B-1.